VLSI Technology
Classical scaling in CMOS, Moore’s Law, Clean room concept, Material properties, crystal structure, lattice, characterization of material based on band diagram and bonding, conductivity, resistivity, sheet resistance, phase diagram and solid solubility.
Growth of single crystal Si, Wafer Cleaning and etching-Wet etch, Dry etch, Plasma etching, RIE etching, etch selectivity/selective etch, Lithography (Photolithography, EUV lithography, X-ray lithography, e-beam lithography etc.) Next generation technologies: Immersion lithography, Phase shift mask, ion lithography, SCALPEL.

